Transistors Shrink

• Photolithography improves
• Process control improves
• 1982: Line width = 3 microns
• 1997: Line width = 0.35 microns
• 2002: Line width = 0.18 microns
• 2004: Line width = 0.13 to 0.09 microns
• 10x in 15 years, 20x in 20 years
• Effective area increase = 100x/400x

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